西安建筑科技大学
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院（系）机电工程学院
专业机械设计制造以及自动化指导教师
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摘要
近年来，在平面和曲面上制造微纳米结构的应用范围越来越广泛，例如柔性显示器、柔性晶体管、柔性存储器和柔性太阳能电池等。我们进行的柔性光刻工艺为生产实践提供了理论基础，具有指导意义。 采用柔性掩膜板来替代目前的玻璃掩膜进行柔性光刻工艺，不仅可方便地实现无残余留膜的图形化结构，图形的制作精度较高，图形尺寸的线宽也较小；而且可以对曲面基底进行曝光，改变了传统光刻只 能对平面基底进行图形化的现状。另外，柔性光刻只需要施加很小的接触力就可以使掩膜板同基底密合接触了，不像传统光刻需要对掩膜板和基底之间造成真空状态以增大两者的密合接触。
本文进行了柔性光刻工艺实验。柔性光刻具体的工艺过程和传统光刻类似，需要基片处理、涂胶、前烘、曝光、显影、坚膜、检测等，最终得到图形化的光刻胶。实验中采取改变单一参数（曝光时间或显影时间）并固定其余参数的方法来研究各参数对光刻质量的影响。利用光学显微镜对光刻图形进行观察对比，从而选择优化的曝光时间和显影时间，得到具有高精度、高保真度的光刻胶图形。
关键词：柔性光刻，柔性掩膜版，光刻胶，曝光，显影
mm理论Abstract
In recent years, the fabrication of micro nano structure application scope is more and more widely in the flat and curved surfaces, such as flexible displays, flexible transistor, flexible memory and flexible solar cells. Soft lithography process we provide a theoretical basis for production practice, has guiding significance.
Flexible mask plate to replace the current glass flexible lithography mask using, not only can be easily achieved without residual graphical structure with film, making high precision graphics, line gr
aph size is smaller; and the curved substrate exposure, changed the status of the graphic on planar substrate traditional lithography only. In addition, soft lithography requires only applied contact force small can make the mask close contact with the substrate, unlike traditional lithography requires close contact caused by vacuum state between the mask and substrate to increase both the alloy.
This article soft lithography process. Soft lithography specific process and the traditional photolithography need similar, substrate processing, coating, drying, exposure, developing, hardening, detection, finally get the patterned photoresist. In the experiment by changing a single parameter (the exposure time and development time) and fixed the parameter method to study the effects of each parameter on image quality. Comparison of the photoresist pattern were observed by optical microscope, so as to choose optimal exposure time and development time, obtained with a photoresist pattern of high precision, high fidelity.
Key Words: soft lithography, flexible mask, resist, exposure, development
目录
1绪论 (1)
(1)
(2)
(2)
(3)
2光刻机及光刻胶 (5)
(5)
(5)
(6)
(7)
(8)
(10)
(12)
(12)
(12)
(13)
(14)
(14)小常识大学问
3柔性光刻工艺流程 (15)过期期刊
(15)
(16)
(24)
(24)
(25)
刘光基
(26)
(26)
(26)
(26)
(27)
(27)
(27)
(27)
(27)
4 柔性光刻工艺实验 (27)
(27)
(28)
(28)
(28)
(29)
(30)
(30)
(32)
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图形检测 (32)
(32)
黄氏女游阴>亚星奔驰
(33)
(37)
(38)
(38)
5 总结 (39)
参考文献 (40)
致谢 (41)
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