摘 要
作为一种器件表面介质膜，SiNx薄膜已被广泛应用于IC以及太阳能光伏器件的制造中。在高效太阳能电池研究中，发射结表面钝化和减反射一直是其研究的主题。电池正面发射结不仅要求表面钝化层有优良的钝化性能，同时也要求介质层能够与表面层减反射膜一起产生很好的减反射效果，从而进一步提高太阳电池器件的光生电流、开路电压以及电池效率。
本文阐述了高效太阳电池研究中正面发射结上的钝化与减反射工艺与原理，重点对PECVD法制备SiNx的钝化机制，H 钝化进行了详细的分析。主要对生产中常使用的管式PECVD和板式PECVD制备的薄膜，通过少子寿命测试仪(WT2000）检测少子寿命，椭偏仪测试膜厚和折射率，积分反射仪测试反射率以及利用HF腐蚀来检验薄膜致密性等手段对薄膜性能进行了分析和比较。又对板式PECVD制备薄膜条件进行了优化。研究发现，氮化硅最佳的沉积条件是：温度370℃，SiH4:NH3=500:自性自度什么意思1600，时间3min；获得了沉积氮化硅后硅片少子寿命高钝化效果好、膜厚与折射率搭配好反射率低的工艺条件。
关键词：氮化硅薄膜；PECVD；减反膜；钝化；太阳能电池用心去工作读后感
THE PASSIVATION OF SILICON NITRIDE FILM ON SOLAR CELLS ANALYSIS AND RESEARCH
ABSTRACT
As a dielectric thin film of device, 尘世佛心SiNx has been widely used in IC and Solar cells京东商城淘宝网 manufacturing . In the research and investigation of high efficiency silicon solar cell, the passivation of front emitter and anti reflection has been their focus. Because，for the front emitter, we need it have excellent passivation quality and good antireflection property, in this way to improve the Isc and Uoc, further more to get much high efficiency.
In this thesis we describe the passivation & Antireflection of high efficient Silicon Solar cells on the front emmiter and then we focus on PECVD analysising the Mechanism of hydrogen passivation. In the experiments I used the tubular and plate PECVD preparing silicon nitride thin film.Then,I texted minority carrier lifetime by minority carrier lifetime test
er(WT2000),film thickness and refractive index by ellipsometer,reflectivity by D8 integral reflectivity,and using HF solution tested the film density.These were used to ailalyze the properties of silicon nitride films.Another,Improving the condition of the plate PECVD deposition .The results show that the temperature of deposition is 370, SiH4:NH3=500:1600, time:3min.In this condition Silicon have a good passivation quality, film thickness and refractive index well matching and low reflectance.
KEY WORDS: silicon nitride film ;gter PECVD; 信息与计算科学论文ACR; passivation; silicon solar cells
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