专利名称：LIQUID DEVELOPMENT APPARATUS AND IMAGE FORMING APPARATUS
发明人：TAKANO YOSHIYUKI，高野 善之,NAKAMURA
MAKOTO，中村 誠
申请号：JP特願2001-290505(P2001-290505)
申请日：20010925
公开号：JP特開2003-98833(P2003-98833A)A
公开日：
20030404
专利附图：
摘要：PROBLEM TO BE SOLVED: To provide a liquid development apparatus which is provided with a developer-holding element for suppressing abrasion, having proper
surface smoothness and not swollen by insulative liquid of a liquid developer. SOLUTION: The liquid development apparatus 4 is provided with a developer accommodating tank 401 for accommodating the liquid developer, an application member 404 for rotating and holding a predetermined quantity of the liquid developer D drawn from the developer-accommodating tank 401 on a surface, the developer-holding element 402 for applying the liquid developer D held on the surface to the electrostatic latent image on an image-holding element 1 and developing, and an intermediate applying member 405 for carrying the liquid developer D from the surface of the applying member 404 to the surface of the developer holding element 402. An elastic layer 402b is formed on a core metal 402a of the developer-holding element 402, and a coating layer 402c is provided on the surface of the elastic layer 402b.
申请人：RICOH CO LTD，株式会社リコー
地址：東京都大田区中馬込1丁目3番6号
国籍：JP
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