专利名称:SUBSTRATE SUPPORT STRUCTURE, HEAT TREATMENT APPARATUS USING SAME, FIRST SHEET-LIKE OBJECT FOR USE IN THE
SUBSTRATE SUPPORT STRUCTURE,
METHOD OF MANUFACTURING THE
SUBSTRATE SUPPORT STRUCTURE, HEAT
TREATMENT APPARATUS, AND SUBSTRATE
SUCKING METHOD
发明人:Yasuhiro Fukumoto,Masao Tsuji,Hiroshi
Miyauchi,Hideyuki Taniguchi
申请号:US11688006
申请日:20070319
公开号:US20070222131A1
公开日:
20070927
摘要:A heat treatment apparatus includes a support sheet placed on an upper surface of a heat-treating plate. The support sheet has, formed on an upper surface thereof, projections for contacting and supporting a substrate, and a lip for contacting edge regions of the substrate. The support sheet is
formed by an etching process, and therefore areas of the sheet around the projections are recessed, rather than being perforated as in the case of laser processing. These heat-treating plate and support sheet constitute a substrate support structure capable of supporting the substrate properly.
申请人:Yasuhiro Fukumoto,Masao Tsuji,Hiroshi Miyauchi,Hideyuki Taniguchi
地址:Kyoto JP,Kyoto JP,Kyoto JP,Kyoto JP
国籍:JP,JP,JP,JP