XPS_Database
Energy (eV) Element Chemical bonding Ref 524.5O1s fluoration avec F2-HF sur fibre C320.00A 117 528.1O1s O2- anion in LaNiO3 244 528.2O1s Ba 155 528.3O1s O ds Li2O après bombardement par l'argon 51 528.3O1s Li2O immergé ds DEC et bomb par l'argon 80min 51 528.3O1s Li2Oap immersion ds DEC(LiPF6) et bomb par argon 51 528.6O1s La2O3 157 528.7O1s PbO ( ? ) 157 528.7O1s O2- oxo- species 159 528.8O1s Sm2O3 157 528.8O1s Eu2O3 157
(oxide) 13 528.8O1s La2O3
528.9O1s Gd2O3 157
(oxide) 13 528.9O1s LaOOH
529O1s CdO 150 529O1s CeO2 150 529O1s TiO2 ( d ) 157 529O1s CdO 157 529O1s CeO2 157 529O1s Nd2O3 157 529O1s Dy2O3 157 529O1s Ho2O3 157 529O1s Rb 155 529O1s Sr 155 529O1s no double bonded in case of Na3PO4 217 529O1s associated with the titanate oxygen, (SrTiO3 surface) 113
(oxide) 13 529O1s CeOOH
529.1O1s Y2O3 157 529.1O1s Er2O3 157 529.1O1s Yb2O3 157 529.1O1s NiO ( 10puis-6 torr) 78 529.1O1s NiO (1er pic) ( 800°C - 10min ) 78 529.1O1s NiO ( air 15min ) 78 529.1O1s NiO ( 250°C -1h ) 78 529.1O1s NiO 60( 800°C-air ) 78 529.1O1s NiO ( 800°C-air+ O2-10min ) 78 529.1O1s O ( 800°C-air+ O2-10min ) 78 529.1O1s O2- anion in LaNiO(4+d) 244
(oxide) 13 529.1O1s Ce2O3
529.2O1s RuO2 150 529.2O1s RuO2 111
529.2O1s CeO(OH)2
(oxide) 13
(oxide) 13 529.2O1s Ce(OH)4
529.2O1s CeO2 214 529.2O1s Ce in mixed oxydes ceria/zirconia. Ce80%- Zr20% Mol 214
(oxide) 13 529.2O1s CeO2
529.3O1s NiO 150 529.3O1s Lu2O3 157 529.3O1s Ce in mixed oxydes ceria/zirconia. Ce68%- Zr32% Mol 214 529.4O1s CuO 150
(TiO2) 43 529.4O1s O-Ti
529.4O1s CaO , ZnO-SiO2 135 529.4O1s PbO2 ( ? ) 157 529.4O1s Cs 155 529.4O1s Ce in mixed oxydes ceria/zirconia. Ce50%- Zr50% Mol 214
(oxide) 13 529.4O1s Y2O3
529.5O1s FeO 89 529.5O1s Fe2O3 89 529.5O1s NiO 157 529.5O1s Ce in mixed oxydes ceria/zirconia. Ce15%- Zr85% Mol 214 529.5O1s Co foil polish- Ar+ etch, +O2 -200°C/30 mn+400°C/30mn 101 529.6O1s TiO2 31 529.6O1s NiO 111 529.6O1s oxydes de Ti,V,Cr,Mn,Fe 60 529.6O1s In2O3 157 529.6O1s Bi2O3 157 529.6O1s CuO 247 529.6O1s NiO 247 529.6O1s CoO 247 529.6O1s TiO2 208 529.6O1s Oxyde 118 529.6O1s Ni foil polish- Ar+ etch, +O2 -200°C/1h+400°C/2h30mn 101 529.7O1s OH , Oads 178 529.7O1s CuFe2O4 247 529.7O1s CoOOH 247 529.7O1s Na 155 529.7O1s Co foil polishing + water immersion/24h 101 529.7O1s Fe=O 201 529.75O1s PbO (70%) / O non ponté 165 529.8O1s Fe3O4 150 529.8O1s TiO2 19 529.8O1s Na2Cr2O7 111 529.8O1s Fe3O4 89 529.8O1s MgO 157 529.8O1s MnO2 157 529.8O1s
ThO2 157
529.8O1s Ca 155 529.8O1s Sb 155 529.8O1s O no-bridging, lead silicate glasses. 165 529.8O1s O-Ti in the TiN coatings before and after erosion 43 529.8O1s TiO2 in the TiN/Si interface 43 529.8O1s Co foil polishing and Ar+ etching, + O2 at 200°C/30mn 101 529.8O1s(after Ar sputtering of SrTiO3 surface) 113 529.8O1s V2O5 219
(oxide) 13 529.8O1s PtO
529.8O1s Ni foil polishing + water immersion/28h 101 529.85O1s NaAlO2 155 529.9O1s FeOOH 89 529.9O1s O (2-) -304 SS- 138 529.9O1s Sc2O3 157 529.9O1s TiO2 ( b ) 157 529.9O1s Fe2O3 157 529.9O1s NiFe2O4 247 529.9O1s Co2O3 247 529.9O1s CoFe2O4 247 529.9O1s Cr2O3 186 529.9O1s O ds O(2-) 1 529.9O1s O ds O2- 216 529.9O1s O2- 87 529.9O1s O 84 529.9O1s alphaFe2O3 89
微生物发酵床
(oxide) 13 529.9O1s CoOOH
529.9O1s Co foil polishing + water immersion/63h 101
(oxide) 13 529.9O1s CoO
(oxide) 13 529.9O1s ZrO2
529.9O1s As-received AlN powder, Al2O3 present near the surface 94 529.9O1s MoO3 219 529.9O1s Ni foil polishing and Ar+ etching, + O2 at 200°C/1h 101 530O1s CoO 150 530O1s Co3O4 150 530O1s Na2MoO4 150 530O1s Fe2O3 111 530O1s CuCrO2 111 530O1s Oads 76 530O1s CoO 157 530O1s Co3O4 157 530O1s ZnO 157 530O1s ZrO2 157 530O1s pic attribué à Fe2O3 182 530O1s O 84 530O1s FeO 89
530O1s Fe2O3
(oxide) 13 530O1s O2- with a sample immersed in a 60°C solution 11网约车
管理系统 (oxide) 13 530O1s PtO2
530O1s NiO
(oxide) 13
(oxide) 13 530O1s Co2O3
530O1s FeO
(oxide) 13
(oxide) 13 530O1s Rh2O3
530.1O1s CO in [Eu(H2daaen)] 166
oxydes 197 530.1O1s Ti
530.1O1s Li2CrO4 111 530.1O1s In 155 530.1O1s Sn 155 530.1O1s PbO(18%) / O non ponté 165 530.1O1s PdO
(oxide) 13
(oxide) 13 530.1O1s SnO2
(oxide) 13 530.1O1s WOOH
530.1O1s O2- with a sample immersed in a room t° solution 11 530.1O1s TiO2 219 530.2O1s Cu2O 150 530.2O1s WO3 111 530.2O1s Cr2O3 111 530.2O1s HfO2 157 530.2O1s NaA 191 530.2O1s CrO3 186 530.2O1s ion oxyde O(-II) 186 530.2O1s pic du Fe2O3 après bombardement (5 min) 182 530.2O1s NaA 155 530.2O1s Fe3O4 89 530.2O1s FeOOH 13
(oxide) 13 530.2O1s Fe3O4
(oxide) 13 530.2O1s WO3
自动平开门systeme 219 530.2O1s TiO2-As2O5
530.3O1s Cu2O 111 530.3O1s Cr2O3 157 530.3O1s Cr2O3 183 530.3O1s Fe3O4 183 530.3O1s O ds PMDA-ODA T=250°C av 1,0 nm de Cr(Cr-oxyde) 131 530.3O1s O ds Cr2O3 176 530.3O1s O2- 156 530.3O1s UO2 160 530.3O1s FeOOH 89
(oxide) 13 530.3O1s CuO折叠式集装箱
(oxide) 13 530.3O1s Cu2O
宝石饰品530.35O1s PbS - air 220j- 89 530.4O1s SnO2 150
530.4O1s silico-alumines 50 530.4O1s SiO2 135 530.4O1s TiO2 ( a ) 157 530.4O1s V2O5 157 530.4O1s CrO3 ( ? ) 157 530.4O1s Nb2O5 157 530.4O1s Ta2O5 157 530.4O1s WO3 157 530.4O1s UO3 160 530.4O1s MoO3,xH2O
(oxide) 13 530.42O1s MoO3 150 530.5O1s Cu2O ( ? ) 157 530.5O1s CuO 157 530.5O1s Ga2O3 157 530.5O1s SnO2 157 530.5O1s Cu2O 247
NaA 191 530.5O1s zeolite 530.5O1s Spinel 118 530.5O1s chemisorbed O- in LaNiO3 244
(oxide) 13 530.5O1s MoO3
530.6O1s CO in H4daaen 166 530.6O1s Al2O3 175 530.6O1s TiO2-Al2O3 19 530.6O1s W/TiN/SiO2/Si 148
alumina 175 530.6O1s Al2O3
530.6O1s TiO2 ( c ) 157 530.6O1s O ds PMDA-ODA après déposition de Ti sur PMDA-ODA 130 530.6O1s O ds structure W/TiN/SiO2/Si 148 530.6O1s Ga 155 530.6O1s chemisorbed O- in LaNiO(4+d) 244
alpha 123 530.68O1s Al2O3
corrundum 66 530.68O1s Al2O3
alpha
平面度怎么
测量alpha 203 530.68O1s Al2O3
530.7O1s Na zeolite (NaAlsiO4) 111 530.7O1s CoMoO4 111 530.7O1s MoO3 157 530.7O1s CoAl2O4 247 530.7O1s Al2O3(gama) 191 530.7O1s Gama-Al2O3 155 530.7O1s SiO2
(oxide) 13 530.7O1s AlN/PPC binder burnout in air 94 530.75O1s vieillissement à l'air de la galène pdt 220j 89 530.8O1s Al2O3 150 530.8O1s Al2TiO5 19 530.8O1s dmso 195
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