不同基底上透明导电薄膜的光学性质分析

摘要

凝胶材料

作为光电科技领域重要的光学薄膜材料之一，透明导电薄膜因其对可见光的高透过率（T avg>80%）和低电阻率（ρ<10-3 Ω·cm）的特点，被广泛应用于液晶显示、触摸屏以及太阳能电池等领域。透明导电薄膜的光学性质很大程度上取决于基底材料，所以研究基底材料对透明导电薄膜的光学性质的影响具有重要意义。金化学性质稳定，导电性能良好，单一的金原子形成的薄膜表现为光学各向同性，能很好地反映基底材料对透明导电薄膜的光学性质的影响。因此，本文选取透明导电金膜作为研究对象，在三种不同的基底材料上沉积透明导电金膜，研究基底对透明导电金膜的光学性质的影响。本文的研究结果，对于制备透明导电薄膜，特别是对光学性质有特殊要求的透明导电薄膜时具有一定的借鉴意义。主要内容如下：

首先，利用直流溅射法，在Si、玻璃和PI基底上沉积透明导电金膜。利用椭圆偏振仪、四探针和扫描电

子显微镜（SEM）分别测量不同溅射条件下的透明导电金膜的厚度、方块电阻、表面形貌的变化规律。结果表明：透明导电金膜的厚度随着溅射时间和溅射电流的增加而增加；方块电阻随着厚度增加而相应地减小；表面形貌随着厚度增加而变得更加连续。通过分析透明导电金膜厚度随电流和时间的变化规律，尝试探究透明导电金膜的直流溅射成膜机理。

其次，通过控制椭圆偏振仪的入射角度以及入射方向（以入射光线绕薄膜法线旋转角度标定），在可见光范围内测量不同基底和基底上透明导电金膜的光学性质变化，探究基底材料的光学性质对透明导电金膜的光学性质的影响。具体结果如下：

(1)对于Si基底，因为选用的单晶硅为各向同性材料，且硅片经过抛光工艺

处理。单一金原子形成的薄膜同样表现为各向同性，在Si表面沉积透明导电金膜，在不同的入射角度和入射方向上，表征的光学参数没有太大变化，同时可以在一定程度确定透明导电金膜的光学性质。

(2)对于玻璃基底，因为玻璃本身为各向同性材料，但是玻璃表面没经过抛

网络流量统计

光工艺处理，表面粗糙度较大。在不同的入射角度下，玻璃表面沉积透明导电金膜前后的光学参数变化明显，而在不同入射方向上，沉积透明导电金薄膜后也较沉积前有相应地变化。这结果一来可以进一步确定透明导电金膜的光学性质，二来可以探究玻璃基底对透明导电金膜的光学性质的影响。

(3)对于PI基底，因为PI膜是有机高分子材料，是典型的各向异性材料，

而且PI膜表面同样粗糙度较大。在不同入射角度和入射方向上的光学参数均发生明显的变化。结果表明在PI膜上沉积透明导电金膜能够探究各向异性基底对透明导电金膜的光学性质的影响。

关键词：透明导电金膜、直流溅射、椭圆偏振仪、光学性质汽车喷水电机

ANALYSIS OF THE OPTICAL PROPERTIES OF THE

TRANSPARENT CONDUCTIVE FILM BASED ON

DIFFERENT SUBSTRATES

ABSTRACT

In the field of photoelectric science and technology, the highly visible light transmittance (T avg>80%) and low resistivity (ρ<10-3Ω·cm) of transparent conductive thin-film materials are used in wide range, such as LCD, touch screen and solar cell etc. The optical properties of the transparent conductive thin film is largely depended on the material properties of the film’s substrate, and it is important to study the impact of the substrates on the optical properties of the transparent conductive film. Gold is selected as the transparent conductive material and deposited on different substrates by DC sputtering, because the performance of gold is chemically stable and often manifests optical isotropy and represents the dependence of film’s optical properties on substrate materials. The results of these study have a certain significance to the preparation of transparent conductive films, especially those claim some special optical requirements. The main content is as follows.

Firstly, the DC sputtering method is used to prepare transparent conductive gold films on Silicon and glass and common flexible substrate PI film respectively. The variation of the thicknesses of transparent conductive gold films which were prepared on different sputtering conditions, is measured by ellipsometer, the square resistance is measured by four-point probe method, and the s

urface morphology is characterized by SEM. The results show that: the thickness of the transparent conductive gold film increases with the increase of sputtering time and sputtering current; the square resistance decreases with the increase of the thickness of the gold film; the surface morphology becomes more continuous with the increase of the thickness. By analyzing the variation of the film thickness with current and time, we try to explore the formation mechanism of the DC sputtering deposition.

Secondly, by controlling the different incident angles and incident directions (calibrate the incident light’s degree rotating around the normal axle of film surface) of an ellipsometer, and we measure the changes of optical properties of different substrates and the transparent conductive gold film on them in visible range, and then explore the impact of the substrates on the optical properties of gold film. Detailed results are as follows:

(1)The selected Si substrate with polishing process is single-crystal silicon, and the single-

crystal silicon is isotropic material. Thin film formed by single atom of gold also performed as isotropic, and optical parameters of gold film deposited to the Si substrate not change much under different incident angles and incident directions, and the same time can determine the optical properties of the transparent conductive gold film to a certain extent.

(2)The selected glass substrate is an isotropic material, but its surface roughness is large

because it’s not polishing. The optical parameters of the glass surface before and after depositing the transparent conductive film changes significantly under different incident angles and incident directions. This result not only further determine the optical properties of transparent conductive gold film, and also can explore the impact of the glass substrate on the optical properties of gold film.

(3)The selected PI substrate is a typical anisotropic organic polymer material, and the PI film

surface roughness is also large. The optical parameters of the PI substrate changed significantly under different incident angles and incident directions. The results show that deposit the gold on PI film can explore the effect of an anisotropic substrate to the optical properties of transparent conductive gold film.

马铃薯曲奇

(Optical engineering)

Supervised by KEYWORDS: Transparent Conductive Gold Film，DC sputtering，Ellipsometer，Optical property

摘要......................................................................................................... I abstract .................................................................................................... I II 目录.......................................................................................................... V 第一章绪论 ..................................................................................... - 1 -

1.1引言............................................................................................................. - 1 -

1.2透明导电薄膜的特性................................................................................. - 3 -

1.2.1透明导电薄膜的导电性 ........................................................................ - 3 -

1.2.2透明导电薄膜的透光性 ........................................................................ - 5 -

1.3透明导电薄膜的制备工艺......................................................................... - 7 -

1.3.1化学方法 ................................................................................................ - 7 -

外置电源1.1.1.1化学气相沉积法..................................................................................... - 7 -

1.1.1.2湿化学方法............................................................................................. - 8 -

1.3.2物理方法 ................................................................................................ - 9 -

1.1.1.3物理气相沉积法..................................................................................... - 9 -

1.3.3直流溅射法........................................................................................... - 10 -

1.4本课题选题及研究工作........................................................................... - 10 -第二章透明导电金膜的制备过程及表征手段........................... - 12 -

2.1透明导电金膜的制备过程....................................................................... - 12 -

2.1.1基底的选择 .......................................................................................... - 12 -

2.1.2制备过程 .............................................................................................. - 12 -

2.2透明导电金膜的表征手段....................................................................... - 13 -自组网电台

2.2.1椭圆偏振仪 .......................................................................................... - 13 -

2.2.1.1椭圆偏振仪知识 .................................................................................. - 13 -

本文发布于:2024-09-23 19:16:48，感谢您对本站的认可！

本文链接：https://www.17tex.com/tex/1/300319.html

上一篇：2023年导电薄膜行业市场前景分析

下一篇：镀膜温度对ITO薄膜光电性能及稳定性的影响

标签：导电透明金膜

留言与评论（共有 0 条评论）