物方远心系统的设计

5460a本科生毕业设计（论文）

物方远心系统的设计

Object S隐藏滑轨连续铸造机ide Telecentric System Design屋顶融雪装置

摘要

光刻是大规模集成电路的制造过程中最为关键的工艺，光刻物镜是光刻的核心，其性能直接决定了光刻的图形传递能力。本文首先对光刻物镜的整个背景作了介绍，阐述了光刻物镜的技术发展过程和未来的发展趋势。并设计了一个光刻物镜的光学系统。从光学设计要求出发，分析了影响光学系统成像质量的各种主要误差因素。通过低温空调ZEMAX软件确定了我们的镜头的光学设计结果。并且进一步地，通过ZEMAX模拟，确定了加工容差，并对其加工和装校过程作了阐述。

关键词：光学设计远心光路物方远心系统

ABSTRACT

Lithography is the most important technics when manufacturing of Large Scale Integrate Circuit.The lithography lens is the core of thelithography, whose capability determines the transfer capability of the pattern directly. The large field projection lithography lens is the one. In this paper, the background of the lithography lens is represented firstly, Expounds the photolithography process and the technological development of the objective trend of the development of future. Design a photo of the objective optical system. we analyzed the various factors which may cause the image quality deterioration of the optical system especially for this type of lenses :in this paper, by ZEMAX simulation we get the result of the lens design, and more, we set the tolerance both for optical parts and mechanical parts, also the procedures of the adjustment and assembly for the whole lenses are described.

Keywords: Lithography objective Resolution Telecentric beam path

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