Wafer edge exposure unit

专利内容由知识产权出版社提供专利名称：Wafer edge exposure unit发明人：三浦 真悦,三村 芳樹申请号：JP特願平10-27145申请日：19980209公开号：JP特許第3356047号(P3356047)B2公开日：20021209摘要：A device for exposure of the peripheral area of a wafer with a small shape andat low costs in which, using a device for stepped exposure of the peripheral area of awafer, the peripheral area of a wafer can be exposed in a ring shape. A wafer to whichresist has been applied is placed on a rotary support and rotated once. The seated stateof the wafer and a singular orienting shape such as an Ori-Fla or the like are on this information, the wafer is positioned in a given position. Then, the rotarysupport is moved by means of an X-Y support and exposure is performed. If thecoordinates of the center of rotation (X THETA , Y THETA ) are taken accurately a ringshape is approached in practice (if, for example, THETA = 0.1 DEG and for a polygon with3600 corners a circle is approached), there is no problem. Two exposure devices are notnecessary, specifically one device for stepped exposure of the peripheral area of a waferand one device for ring-shaped exposure of the peripheral area. The peripheral area ofthe wafer can be exposed both in a step-shape and also ring-shape with a single ore the area occupied by the device can be reduced, as can equipment costs. In thecase of stepped exposure of one part of the peripheral area of the wafer and ring-shaped exposure of the other part thereof, the wafer need not be rmore, the peripheral edge of the wafer need be determined only once. Therefore

throughput can be increased. Using a device for stepped exposure of the peripheral areaof the wafer, the peripheral area of the wafer can be exposed in a ring shape withoutusing a memory with a high capacity. The peripheral area of the wafer can be exposed in aring shape without bringing the wafer center and the center of the rotary support intoagreement with one another. Therefore a centering device is unnecessary. The centeringprocess is eliminated. Thus both the device and actuation can be simplified.

申请人：ウシオ電機株式会社地址：東京都千代田区大手町2丁目6番1号 朝日東海ビル19階国籍：JP代理人：長澤 俊一郎