MANUFACTURE OF CAPACITOR

专利内容由知识产权出版社提供专利名称：MANUFACTURE OF CAPACITOR发明人：NAKAMURA TAKASHI,中村 孝申请号：JP特願平9-326851申请日：19971128公开号：JP特開平11-163271A公开日：19990618专利附图：摘要：PROBLEM TO BE SOLVED: To provide the manufacture of a capacitor, in whichthe deterioration of capacitance characteristics and breakdown-strength characteristicsand the lowering of yield due to nonuniformity in the film thickness of a ferroelectriclayer are not generated, even if there exist foreign matters and irregularities on asubstrate surface. SOLUTION: When a capacitor, in which a lower electrode 2 consisting ofa material containing a precious metal is formed on a substrate 1, a dielectric layer 3consisting of a ferroelectric or a high dielectric-constant material or the like is formed onthe lower electrode 2 and an upper electrode 4 is shaped onto the dielectric layer 3, is

manufactured, the lower electrode 2 is formed so that the surface of the lower electrode2 is planarized by the application of a coating agent for an electrode material, and thedielectric layer 3 is formed on the lower electrode 2.申请人：ROHM CO LTD,ローム株式会社地址：京都府京都市右京区西院溝崎町21番地国籍：JP代理人：河村 洌